Diffusion furnace
In the diffusion furnace, atoms are diffused with silicon in a high-temperature furnace after phosphorous atoms are applied to the surface of the wafer. An N-doped layer is then created on the wafers. To ensure high quality of this thermal process, accurate and fast temperature control is key.
Related Applications
In the thermal processes, the equipment requires an optimal wafer handling system is required. The handling of the...
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The variety of surface conditions on a wafer makes stable wafer detection difficult. Some thin-films (like...
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During the cell/module production process, the wafer cassettes are managed centrally and locally. In the case of...
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The specifications of each machine have to be designed for each production line, so the structure of a machine...
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Temperature changes caused by mechanical disturbance have to be recovered quickly in order to maintain high...
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Safe operation is always a key issue. The interlock system protects operator and system from unsafe conditions....
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When cell breakage or string parallelism is inspected, the various surface colours and shapes make it difficult to...
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