Vacuum process

Vacuum processes, such as plasma CVD, PVD, dry etching, ashing, etc., are applied for coating or etching thin films on wafers. Sensitive process control, as well as clean and high-vacuum environments, are required. To achieve the best performance, Omron offers high process visibility of the process for parameter extraction/optimization, quick start-up and adjustment of machine differences, and failure analysis. Sensing integrity is essential to ensure safe and stable operation. Omron offers sensing solutions that meet this requirement for vacuum processes.