Stage position measurement
Challenge
During long-term usage, the position of the stage-base can shift slightly, which has a negative influence on the accurate process.
Therefore, the stage-base should be re-aligned regularly. However, the measuring system has to avoid mechanical interference with movements of the stage-base.
Solution
Omron offers high-precision contact-type displacement sensors. It enables the stage-base gap to be measured with sub-micron resolution.
An air-push type vacuum-retractor is available to avoid mechanical interference.
Benefit
These sensors offer not only accurate positioning for long-term operation, but also easy maintenance.
Related Applications
It requires precision to put the required circuits on the wafer’s surface. Since the lithography process has to be...
>>
The stage-base has to be kept horizontal to process the wafer accurately.
The movement of the gantry or X/Y...
>>
The reticle SMIF-pod (standard mechanical interface) is applied to manage recticles during the lithography...
>>
During long-term usage, the position of the stage-base can shift slightly, which has a negative influence on the...
>>
