Photolithography
In the photo-lithography process, photo-resist film is coated on the surface of a wafer. Then circuit patterns are formed on the surface of the wafer, exposing light through a photo-mask. A lens reduces the size of the pattern to sub-micron level.
After exposure, the wafer surface is developed to remove the photo-resist layer of exposed pattern.
Lithography is one of most critical processes for semiconductor production.
Related Applications
It requires precision to put the required circuits on the wafer’s surface. Since the lithography process has to be...
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The stage-base has to be kept horizontal to process the wafer accurately.
The movement of the gantry or X/Y...
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The reticle SMIF-pod (standard mechanical interface) is applied to manage recticles during the lithography...
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During long-term usage, the position of the stage-base can shift slightly, which has a negative influence on the...
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